Thin film absorption characterization by focus error thermal lensing

A simple, highly sensitive technique for measuring absorbed power in thin film dielectrics based on thermal lensing is demonstrated. Absorption of an amplitude modulated or pulsed incident pump beam by a thin film acts as a heat source that induces thermal lensing in the substrate. A second continuo...

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Detalles Bibliográficos
Autores principales:	Domené, E.A., Schiltz, D., Patel, D., Day, T., Jankowska, E., Martínez, O.E., Rocca, J.J., Menoni, C.S.
Formato:	JOUR
Materias:	Dielectric materials Errors Film growth Fused silica Optical pumping Probes Silica Substrates Amplitude modulated Dielectric thin films Focus error signal Four quadrant detectors Fused silica substrates Noise contributions Sensitive techniques Thin-film dielectrics Thin films
Acceso en línea:	http://hdl.handle.net/20.500.12110/paper_00346748_v88_n12_p_Domene
Aporte de:	Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires

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