Radiation defects studies on Ar-lmplanted Hg1-xCdxTe

Radiation induced defects are studied in Hg1-xCdxTe (MCT) ISOVPE grown epitaxial film after the implantation with Ar++ (300 keV). The influence of ion-radiation damage on the electrical properties of MCT has been also investigated. A comparison of the defects profiles is performed after the irradiat...

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Autor principal: Aguirre, M.H
Otros Autores: Cánepa, Horacio Ricardo, De Walsöe Reca, N.E
Formato: Capítulo de libro
Lenguaje:Inglés
Publicado: Trans Tech Publications Ltd 1997
Acceso en línea:Registro en Scopus
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100 1 |a Aguirre, M.H. 
245 1 0 |a Radiation defects studies on Ar-lmplanted Hg1-xCdxTe 
260 |b Trans Tech Publications Ltd  |c 1997 
270 1 0 |m Aguirre, M.H.; PRINSO, CONICET-CITEFA, Zufriategui 4380, Villa Martelli 1603, Pcia de Buenos Aires, Argentina 
504 |a Irvine, S., Mullin, J., (1981) J. Crystal Growth, 55, p. 107 
504 |a Destéfanis, G.L., (1988) J. Crystal Growth, 86, p. 700 
504 |a Willardson, R., Beer, A., (1981) W.F.H. Micklethwaite in Semiconductors and Semimetals, 18. , Academic Press, Chapter 3 
504 |a Gilabert, U., Serravalle, O., Heredia, E., Cánepa, H., Trigubó, A., De Walsöe Reca, N.E., (1995) Anales de la Asociación Quimica Argentina, 83, p. 65 
504 |a Chu, W., Mayer, J., Nicolet, M., (1978) Backscattering Spectrometry, , Academic Press, Inc Chapters 
504 |a Quéré, Y., (1974) J. Nucl Mater, 53 (262) 
504 |a (1976) Radiat Eff, 28, p. 253 
504 |a Picraux, S., Rimini, E., Foti, G., Campisano, S., (1978) Phys Rev., B, 18, p. 2078 
504 |a Ziegler, J.F., (1992) Handbook of Ion Implantation Technology, , Elsevier Science Publishers B. V. North-Holland 
504 |a Feldman, L., Rodgers, J., (1970) J Appl Phys, 41, p. 3776 
504 |a Feldman, L., Mayer, J., Picraux, S., (1982) Materials Analysis by Ion Channeling, , Academic Press, NY, Chapter 4 
504 |a Quéré, Y., (1968) Phys Status Solidi, 30, p. 713 
504 |a Mory, J., Quéré, Y., (1972) Radiat Eff., 13, p. 57 
506 |2 openaire  |e Política editorial 
520 3 |a Radiation induced defects are studied in Hg1-xCdxTe (MCT) ISOVPE grown epitaxial film after the implantation with Ar++ (300 keV). The influence of ion-radiation damage on the electrical properties of MCT has been also investigated. A comparison of the defects profiles is performed after the irradiation of MCT with different concentrations (x = 0.1 and 0.2 ) and different crystallines orientations: (111), (110) and (100). Results are discussed pointing out that stacking faults are probable near projected range (Rp) depth while interstitials seem to be more probable at deeper distances than Rp.  |l eng 
593 |a PRINSO, CONICET-CITEFA, Zufriategui 4380, Villa Martelli 1603, Pcia de Buenos Aires, Argentina 
593 |a Dpto. de Fisica, Facultad de Ciencias Exactas, Universidad de Buenos Aires, Buenos Aires, Argentina 
690 1 0 |a INFRARED DETECTORS 
690 1 0 |a ION IMPLANTATION 
690 1 0 |a RADIATION DEFECTS 
690 1 0 |a RUTHERFORD BACKSCATTERING SPECTROSCOPY AND CHANNELING 
700 1 |a Cánepa, Horacio Ricardo 
700 1 |a De Walsöe Reca, N.E. 
773 0 |d Trans Tech Publications Ltd, 1997  |g v. 152  |h pp. 33-40  |p Defect Diffus. Forum  |x 10120386  |t Defect and Diffusion Forum 
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