TiN coatings generated with a pulsed plasma arc

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A systematic study of TiN coatings produced with a low-energy pulsed plasma arc (500 A peak current, 35 ms half-amplitude-full-width duration) is presented. The N2 background pressure was varied in the range 0.6-10 mbar. Several diagnostic techniques were employed to study the coatings: Scotch tape...

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Autor principal: Bruzzone, Horacio Abel
Otros Autores: Kelly, H., Márquez, A., Lamas, D., Ansaldi, A., Oviedo, C.
Formato: Capítulo de libro
Lenguaje:Inglés
Publicado: 1996
Acceso en línea:Registro en Scopus
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100 1 |a Bruzzone, Horacio Abel 
245 1 0 |a TiN coatings generated with a pulsed plasma arc 
260 |c 1996 
270 1 0 |m Bruzzone, H.; Inst. de Física del Plasma, Departamento de Física, Ciudad Universitaria Pab. I, (1428) Buenos Aires, Argentina 
504 |a Harris, L.P., (1980) Vacuum Arcs, p. 134. , ed J M Lafferty (New York: Wiley) 
504 |a Kimblin, C.W., (1974) J. Appl. Phys., 45, p. 5235 
504 |a Boxman, R.L., Goldsmith, S., (1989) IEEE Trans. Plasma Sci., 17, p. 705 
504 |a Naoe, M., Yamanaka, S., (1970) Japan. J. Appl. Phys., 9, p. 293 
504 |a Osipov, V.A., Padalka, V.G., Sablev, L.P., Stupak, R.I., (1978) Prib. Tekh. Eksp., 6, p. 173 
504 |a Aksenov, I.I., Belous, V.A., Padalka, V.G., Khoroshikh, V.M., (1977) Fiz. Khim. Obrab. Mat., 6, p. 89 
504 |a Andreev, A.A., Gavrilko, I.V., Kunchenko, V.V., Lokoshko, V.V., Soprykin, L.I., (1980) Fiz. Khim. Obrab. Mat., 3, p. 64 
504 |a Boxman, R.L., Goldsmith, S., Shalev, S., Yaloz, H., Brosh, N., (1986) Thin Solid Films, 139, p. 41 
504 |a Boxman, R.L., Goldsmith, S., (1987) Surf. Coat. Technol., 33, p. 153 
504 |a Bababeygy, S., Boxman, R.L., Goldsmith, S., (1987) IEEE Trans. Plasma Sci., 15, p. 599 
504 |a Michalski, A., Sokolowska, A., (1985) Thin Solid Films, 129, p. 249 
504 |a Michalski, A., Sokolowska, A., (1985) J. Mater., 20, p. 1842 
504 |a Yan, P., Yang, S., (1994) Phys. Status Solidi a, 145, pp. K29 
504 |a Sokolowski, M., Sokolowska, A., Michalski, A., Romanowski, Z., Rusek Mazurek, A., Wronikowski, M., (1981) Thin Solid Films, 80, p. 249 
504 |a Kelly, H., Márquez, A., Libertun, A., Martinez, J., A low energy vacuum arc for coating purposes (1993) Proc. 2nd Encontro Brasileiro de Física Dos Plasmas (Sao Paulo, Brazil) 1993, p. 26 
504 |a Cullity, B.D., (1959) Elements of X-Ray Diffraction, p. 422. , Reading, MA: Addison-Wesley 
504 |a Biwer, R.M., Bernasek, L.S., (1986) Surf Sci., 167, p. 207 
504 |a Porte, L., Rouz, L., Hanus, J., (1983) Phys. Rev. B, 28, p. 3214 
504 |a Schiller, S., Beister, G., Sieber, W., (1984) Thin Solid Films, 111, p. 259 
506 |2 openaire  |e Política editorial 
520 3 |a A systematic study of TiN coatings produced with a low-energy pulsed plasma arc (500 A peak current, 35 ms half-amplitude-full-width duration) is presented. The N2 background pressure was varied in the range 0.6-10 mbar. Several diagnostic techniques were employed to study the coatings: Scotch tape test, weighting, scanning electron microscopy (SEM), x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and Vickers microhardness. The results show that two different microstructures of the coatings can be obtained by changing the operating pressure value: a low-pressure regime where the coating presents high porosity, with agglomerates of diameter in the range 10-60 μm; and a high-pressure regime, for which the coatings are more uniform and dense, with agglomerates of less than 3 μm size.  |l eng 
593 |a Inst. de Física del Plasma, Departamento de Física, Ciudad Universitaria Pab. I, (1428) Buenos Aires, Argentina 
593 |a CITEFA, Zufriategui 4380, (1603) Villa Martelli Buenos Aires, Argentina 
593 |a Departamento de Materiales (CNEA), Av. Libertador 8250, (1429) Buenos Aires, Argentina 
690 1 0 |a COATING TECHNIQUES 
690 1 0 |a ELECTRIC ARCS 
690 1 0 |a HARDNESS 
690 1 0 |a METALLOGRAPHIC MICROSTRUCTURE 
690 1 0 |a POROSITY 
690 1 0 |a PROTECTIVE COATINGS 
690 1 0 |a SCANNING ELECTRON MICROSCOPY 
690 1 0 |a TIN ALLOYS 
690 1 0 |a X RAY DIFFRACTION ANALYSIS 
690 1 0 |a X RAY PHOTOELECTRON SPECTROSCOPY 
690 1 0 |a PULSED PLASMA ARCS 
690 1 0 |a VICKERS MICROHARDNESS 
690 1 0 |a PLASMA APPLICATIONS 
700 1 |a Kelly, H. 
700 1 |a Márquez, A. 
700 1 |a Lamas, D. 
700 1 |a Ansaldi, A. 
700 1 |a Oviedo, C. 
773 0 |d 1996  |g v. 5  |h pp. 582-587  |k n. 3  |p Plasma Sources Sci Technol  |x 09630252  |t Plasma Sources Science and Technology 
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