Microlithography world

Detalles Bibliográficos
Autor Corporativo: Society of Photo-optical Instrumentation Engineers
Formato: Electrónico Revista
Lenguaje:Inglés
Publicado: Port Washington, N.Y. : Penn Well Publication, published in cooperation with SPIE, [1992]-2008.
Materias:
Acceso en línea:Available in Academic Search Premier.
Aporte de:Registro referencial: Solicitar el recurso aquí
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130 0 |a Microlithography world (Online) 
222 1 0 |a Microlithography world 
245 0 0 |a Microlithography world  |h [electronic resource]. 
260 |a Port Washington, N.Y. :  |b Penn Well Publication, published in cooperation with SPIE,  |c [1992]-2008. 
310 |a Quarterly,  |b Jan./Feb./Mar. 1993- 
362 0 |a Vol. 1, no. 1 (Mar./Apr. 1992)- 
362 1 |a Ceased with v. 17, no. 4 (Nov. 2008). 
500 |a Title from cover. 
500 |a Published: Tulsa, OK, Oct., Nov., Dec. 1993- 
650 0 |a Semiconductors  |x Design and construction  |v Periodicals. 
650 0 |a Microlithography  |v Periodicals. 
650 0 |a Masks (Electronics)  |v Periodicals. 
650 1 7 |a Microlithografie.  |2 gtt 
710 2 |a Society of Photo-optical Instrumentation Engineers. 
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776 1 |t Microlithography world  |x 1074-407X  |w (OCoLC)28982886  |w (DLC)93659127 
856 4 0 |3 Full text available: May 2003-Nov 2008.  |z Available in Academic Search Premier.  |u https://search.ebscohost.com/direct.asp?db=aph&jid=%229CK%22&scope=site 
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