Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography

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Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.

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Detalles Bibliográficos
Autores principales: Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J.
Formato: CONF
Materias:
Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_10928081_v_n_p486_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
id todo:paper_10928081_v_n_p486_Wachulak
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spelling todo:paper_10928081_v_n_p486_Wachulak2023-10-03T16:04:58Z Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography Wachulak, P.W. Capeluto, M.G. Patel, D. Marconi, M.C. Menoni, C.S. Rocca, J.J. Annual meetings Electro-optics Interferometric lithography Geodetic satellites Interferometry Lasers Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE. CONF info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by/2.5/ar http://hdl.handle.net/20.500.12110/paper_10928081_v_n_p486_Wachulak
institution Universidad de Buenos Aires
institution_str I-28
repository_str R-134
collection Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA)
topic Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
spellingShingle Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
Wachulak, P.W.
Capeluto, M.G.
Patel, D.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
topic_facet Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
description Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.
format CONF
author Wachulak, P.W.
Capeluto, M.G.
Patel, D.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
author_facet Wachulak, P.W.
Capeluto, M.G.
Patel, D.
Marconi, M.C.
Menoni, C.S.
Rocca, J.J.
author_sort Wachulak, P.W.
title Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_short Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_full Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_fullStr Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_full_unstemmed Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
title_sort nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
url http://hdl.handle.net/20.500.12110/paper_10928081_v_n_p486_Wachulak
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