Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography

Mostrar todas las versiones(2)

Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.

Guardado en:
Detalles Bibliográficos
Autores principales: Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J.
Formato: CONF
Materias:
Annual meetings
Electro-optics
Interferometric lithography
Geodetic satellites
Interferometry
Lasers
Acceso en línea:http://hdl.handle.net/20.500.12110/paper_10928081_v_n_p486_Wachulak
Aporte de:
Biblioteca Digital - Facultad de Ciencias Exactas y Naturales (UBA) de Universidad de Buenos Aires
Descripción
Sumario:Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.

Ejemplares similares