Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top λ=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose. ©2007 IEEE.
Guardado en:
| Autores principales: | Wachulak, P.W., Capeluto, M.G., Patel, D., Marconi, M.C., Menoni, C.S., Rocca, J.J. |
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| Formato: | CONF |
| Materias: | |
| Acceso en línea: | http://hdl.handle.net/20.500.12110/paper_10928081_v_n_p486_Wachulak |
| Aporte de: |
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